Type:Ceramic Molecular Drag Pump
Model:MDP 5011
Manufacturer:Alcatel
Flow Rate:Up to 200 l/s
Vacuum Range:10^-2 to 10^-10 mbar
Operating Pressure:10^-1 to 10^-9 mbar
Power Consumption:1.5 kW
Shaft Rotation:18,000 rpm
Material:Ceramic rotor, stainless steel housing
Dimensions:W: 250mm, D: 350mm, H: 500mm
Weight:Approximately 60 kg
Certifications:CE, ISO 9001:2015
The Alcatel MDP 5011 Ceramic Molecular Drag Pump is a cutting-edge solution for achieving the ultra-high vacuum conditions required in semiconductor fabrication processes. Utilizing state-of-the-art ceramic components, this pump provides exceptional durability and reliability under extreme conditions. Its design incorporates multiple stages of molecular drag technology, ensuring efficient gas extraction even at extremely low pressures.
The pump’s modular construction allows for easy maintenance and replacement of critical components without the need for system downtime. This feature significantly reduces maintenance costs and enhances operational efficiency.
Additionally, the MDP 5011 is equipped with advanced control electronics that provide real-time monitoring and diagnostics, enabling proactive maintenance scheduling and minimizing unexpected downtimes.
Installation is straightforward, thanks to its user-friendly interface and comprehensive installation guide provided by Alcatel. The pump operates quietly, making it suitable for use in cleanroom environments where noise levels are strictly controlled.
Compliance with ISO 9001 standards ensures consistent quality, while certifications like CE, UL, and RoHS guarantee safety and environmental compliance. The Alcatel MDP 5011 is an indispensable tool for any modern semiconductor manufacturing facility.











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